| The series of the equipments mainly integrate the technology of MF magnetron sputtering and electric arc ion evaporation,combining the ion source and the pulse bias voltage .It is full automation control when coating films. It is widely used in the watchband, watchcase,mobile shell,hardware,tableware,etc. It can coat TiNTiCTiCNTiAINCrNCuAuAl2O3 and other decorative films. Parameter Description | Mode | JTL-1090 | JTL-1110 | JTL-1312 | JTL-1612 | | Dimension | Φ1000900mm | Φ11001000mm | Φ12001200 mm | Φ16001200 mm | Coating mode and main confirguration | 3 electric-arc+2 pairs of plane rectangular cathode | 6 electric-arc+2 pairs of cylindrical cathode+a pairs of plane rectangular cathode | 5 electric-arc+4 pairs of cylindrical cathode+a pairs of plane rectangular cathode | 6 electric-arc+8 pairs of cylindrical cathode+a pairs of plane rectangular cathode | Film Types | Metal films,Dielectric films,Compound films,Reaction films,Muti-layer function films | Power source | Electric arc power supply,DC magnetron power supply,MF magnetron power supply.Pulse bias voltage power source power supply. | Vacuum Chamber Structure | Pre-open vertical(single) door ,postposition pump system,double water-cooling | Vacuum system | Molecule pump(diffusion pump)+Roots pump +Mechanical pump | Utimate vacuum | 2.010 -4 | Pumping speed | Pumping time less than 15 minutes ,from atmospheric pressure to 310 -3 Pa | Movement of the workpiece | Revolution/rotation,variable frequency speed adjustable | Baking temperature of the workpiece | Adjustable and controllable from room temperature to a350oC,radiation heating | Control mode | Full automation control system PC+PLC/PC+HMI | Remark | We can design the machine according to you workpiece and special technological requirement |
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