ITO sputtering target
Listing ID#10214931
CategoryNon-ferrous Metal

ITO sputtering target

Specifications

Brand
YAM
Origin
China
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Quick answer

ITO sputtering target is a Non-ferrous Metal product. Key specs — Brand: YAM; Origin: China.

Product Description

ITO Target
Principal Uses
Transparent conductive ITO film deposited by Magnetic Sputtering.
Physical Properties
Chemical Formula : In2O3/SnO2
Relative Density : >=99%
Crystal Particle Size : 5~15µm
Electrical Resistivity : 0.12m·cm
Linear Thermal Expansion : 8.2×10-3K-1
Purity : >=99.99%
Appearance : Black Ceramic Piece
Impurity (unit: ppm) :
ElementAlSbCdCuFePbNiSiZnBa
Content (<=)555101010101555
characterisation Methods
Crystal Particle Size : Observed by SEM
Purity : Tested by ICP—AES means
Density : Tested by Archimedes Means

ITO sputtering target

The practical density is more than 7.05g/cm3 ,
the purity is more than 99.99% ,
the relative density is more than 99%.

The size which our company can meet is as following:
1) The plate sputtering target:
all size within 600*300mm*20mm
2) The cylinder sputtering target:
the diameter: 50-400mm
the thickness: 5-18mm
the height: 50-250mm

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